Electron Microscopy Sciences Silicon Nitride Nanoporous Tem Window Grid, 20nm

Electron Microscopy Sciences Silicon nitride tem window grids perform well under harsh conditions. They tolerate temperatures above 1000 deg c and support use in environmental tems where dynamic processes are observed at high temperatures. They provide an ideal balance of imaging resolution, chemical stability and mechanical strength. They can be vigorously plasma cleaned to remove organic contamination. The incorporate lpcvd, low-stress(~250mpa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces. Silicon frames are 100um thick. There is less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation. - EMS