Electron Microscopy Sciences 1.2 Μm, 180 X 180 Layout, 2.5 Μm Pitch

Electron Microscopy Sciences Holy silicon nitride microporous tem grids with square pattern has square patterns on 200 nm silicon nitride. With a window sixe of 0.5 x 0.5 nm, a frame thickness of 200 µm, and membrane thinknes of 200 nm. Resistant to acids, bases and solvnets. They tolerate high-temperature experiments and imaging up to 1000°c. Can be easily plasma-cleaned to remove organic contamination. - EMS